Low GDD ultrafast mirrors
Low GDD ultrafast mirrors exhibit high reflectance with minimal group delay dispersion (GDD) at certain wavelength range and angle of incidence. These mirrors enable to eliminate ultrashort optical pulse broadening effect and maintain high peak power as compared to ordinary high reflectivity laser mirrors.
Individuelle Anfrage
Lagerbestand anzeigen
- Description
- Curves
- Standard specifications
Low GDD ultrafast mirrors exhibit high reflectance with minimal group delay dispersion (GDD) at certain wavelength range and angle of incidence. These mirrors enable to eliminate ultrashort optical pulse broadening effect and maintain high peak power as compared to ordinary high reflectivity laser mirrors.
| Low GDD ultrafast mirrors | |
|---|---|
| Substrate material | UV grade fused silica |
| Clear aperture | >85% |
| Face dimensions tolerance | +0,0/-0,15 mm |
| Thickness tolerance | ±0,25 mm |
| Parallelism error | <30 arcsec |
| Protective chamfers | <0,35 mm at 45° |
| Surface quality | 20-10 S-D |
| Surface flatness | <λ/8@632,8 nm |
| Group delay dispersion | <100 fs2 @ 750-850nm |
| Laser-induced damage threshold | >2 J/cm2@800 nm, 200 ps (for 730-870 nm mirrors) |
Artikel bestellen
Material
Face dimensions
Thickness
Group delay dispersion
Clear aperture
Thickness tolerance
Surface quality
Protective chamfers
Coating S1
SKU
PREIS
Herunterladen
MENGE
UVFS
⌀50,8 mm
6,35 mm
<100 fs2 @ 750-850nm
90%
±0,2 mm
20-10 S-D
<0,5 mm at 45°
HR(Rs>99,5%@710-890 nm; Rp>98,5%@740-860 nm)
18689
150 €
UVFS
⌀50,8 mm
6,35 mm
<100 fs2 @ 750-850nm
90%
±0,2 mm
20-10 S-D
<0,5 mm at 45°
HR(R>99,5%)@730-870 nm
18796
150 €
UVFS
⌀25,4 mm
5 mm
<100 fs2 @ 750-850nm
90%
±0,2 mm
20-10 S-D
<0,25 mm at 45°
HR(R>99,5%)@730-870 nm
28437
85 €
UVFS
⌀25,4 mm
5 mm
<100 fs2 @ 750-850nm
90%
±0,2 mm
20-10 S-D
<0,25 mm at 45°
HR(Rs>99,5%@710-890 nm; Rp>98,5%@740-860 nm)
9531
85 €
1
/1
Show all