Low GDD ultrafast mirrors
Main features
- Mirror substrates fabricated from high-quality UV grade fused silica
- Standard substrate dimensions are ø25,4 x 5 mm
- 0° or 45° angle of incidence selection
- Coating stack is designed to have low dispersion (GDD) for the reflected wavelengths
- Custom coatings, substrate material, and dimensions are available upon request
Application examples
- High reflectivity mirrors for tunable and broadband ultrashort laser sources
- Broadband light beam steering and folding
Request custom
View stock
- Description
- Curves
- Standard specifications
Low GDD ultrafast mirrors exhibit high reflectance with minimal group delay dispersion (GDD) at certain wavelength range and angle of incidence. These mirrors enable to eliminate ultrashort optical pulse broadening effect and maintain high peak power as compared to ordinary high reflectivity laser mirrors.
| Low GDD ultrafast mirrors | |
|---|---|
| Substrate material | UV grade fused silica |
| Clear aperture | >85% |
| Face dimensions tolerance | +0,0/-0,15 mm |
| Thickness tolerance | ±0,25 mm |
| Parallelism error | <30 arcsec |
| Protective chamfers | <0,35 mm at 45° |
| Surface quality | 20-10 S-D |
| Surface flatness | <λ/8@632,8 nm |
| Group delay dispersion | <100 fs2 @ 750-850nm |
| Laser-induced damage threshold | >2 J/cm2@800 nm, 200 ps (for 730-870 nm mirrors) |
Order your item
Material
Face dimensions
Thickness
Group delay dispersion
Clear aperture
Thickness tolerance
Surface quality
Protective chamfers
Coating S1
SKU
PRICE
Download
QUANTITY
UVFS
⌀50,8 mm
6,35 mm
<100 fs2 @ 750-850nm
90%
±0,2 mm
20-10 S-D
<0,5 mm at 45°
HR(Rs>99,5%@710-890 nm; Rp>98,5%@740-860 nm)
18689
150 €
UVFS
⌀50,8 mm
6,35 mm
<100 fs2 @ 750-850nm
90%
±0,2 mm
20-10 S-D
<0,5 mm at 45°
HR(R>99,5%)@730-870 nm
18796
150 €
UVFS
⌀25,4 mm
5 mm
<100 fs2 @ 750-850nm
90%
±0,2 mm
20-10 S-D
<0,25 mm at 45°
HR(R>99,5%)@730-870 nm
28437
85 €
1
/1
Show all