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Low GDD ultrafast mirrors
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Low GDD ultrafast mirrors

Main features

 

  • Mirror substrates fabricated from high-quality UV grade fused silica
  • Standard substrate dimensions are ø25,4 x 5 mm
  • 0° or 45° angle of incidence selection
  • Coating stack is designed to have low dispersion (GDD) for the reflected wavelengths
  • Custom coatings, substrate material, and dimensions are available upon request

 

Application examples

 

  • High reflectivity mirrors for tunable and broadband ultrashort laser sources
  • Broadband light beam steering and folding
Request custom View stock
  • Description
  • Curves
  • Standard specifications

Low GDD ultrafast mirrors exhibit high reflectance with minimal group delay dispersion (GDD) at certain wavelength range and angle of incidence. These mirrors enable to eliminate ultrashort optical pulse broadening effect and maintain high peak power as compared to ordinary high reflectivity laser mirrors.

Low GDD ultrafast mirrors
Substrate material UV grade fused silica
Clear aperture >85%
Face dimensions tolerance +0,0/-0,15 mm
Thickness tolerance ±0,25 mm
Parallelism error <30 arcsec
Protective chamfers <0,35 mm at 45°
Surface quality 20-10 S-D
Surface flatness <λ/8@632,8 nm
Group delay dispersion <100 fs2 @ 750-850nm
Laser-induced damage threshold >2 J/cm2@800 nm, 200 ps (for 730-870 nm mirrors)
Order your item
Material Face dimensions Thickness Group delay dispersion Clear aperture Thickness tolerance Surface quality Protective chamfers Coating S1 SKU PRICE Download QUANTITY
UVFS
⌀50,8 mm
6,35 mm
<100 fs2 @ 750-850nm
90%
±0,2 mm
20-10 S-D
<0,5 mm at 45°
HR(Rs>99,5%@710-890 nm; Rp>98,5%@740-860 nm)
18689
150 €
UVFS
⌀50,8 mm
6,35 mm
<100 fs2 @ 750-850nm
90%
±0,2 mm
20-10 S-D
<0,5 mm at 45°
HR(R>99,5%)@730-870 nm
18796
150 €
UVFS
⌀25,4 mm
5 mm
<100 fs2 @ 750-850nm
90%
±0,2 mm
20-10 S-D
<0,25 mm at 45°
HR(R>99,5%)@730-870 nm
28437
85 €
UVFS
⌀25,4 mm
5 mm
<100 fs2 @ 750-850nm
90%
±0,2 mm
20-10 S-D
<0,25 mm at 45°
HR(Rs>99,5%@710-890 nm; Rp>98,5%@740-860 nm)
9531
85 €

4Lasers