Low GDD mirrors
Main features
- Mirror substrates fabricated from high-quality UV grade fused silica
- Standard substrate dimensions are ø25,4 x 5 mm
- 0° or 45° angle of incidence selection
- Coating stack is designed to have low dispersion (GDD) for the reflected wavelengths
- Custom coatings, substrate material, and dimensions are available upon request
Application examples
- High reflectivity mirrors for tunable and broadband ultrashort laser sources
- Broadband light beam steering and folding
Request custom
- Description
- Standard specifications
Ultrafast low-GDD mirrors provide high reflectance while minimizing group delay dispersion (GDD). Their performance is based on precisely engineered dielectric thin-film coatings, which utilize optical interference effects to achieve both high reflectivity and controlled dispersion. Deposited on high-purity fused silica substrates, these coatings ensure minimal pulse broadening, making them ideal for femtosecond and picosecond laser systems.
| Low GDD mirrors | |
|---|---|
| Substrate material | UV grade fused silica |
| Clear aperture | >85% |
| Face dimensions tolerance | +0,0/-0,15 mm |
| Thickness tolerance | ±0,25 mm |
| Parallelism error | <30 arcsec |
| Protective chamfers | <0,35 mm at 45° |
| Surface quality | 20-10 S-D |
| Surface flatness | <λ/8@632,8 nm |
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Material
Face dimensions
Thickness
Coating S1
AOI
Group delay dispersion
SKU
PRICE
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QUANTITY
UVFS
⌀25,4 mm
5 mm
HR>99,5%@254-260 nm
0°
|GDD Rs|<10 fs2, |GDD Rp|<20 fs2
36394
Request
UVFS
⌀25,4 mm
5 mm
HRs>99,6%+HRp>99%@254-260 nm
45°
|GDD Rs|<10 fs2, |GDD Rp|<20 fs2
36398
140 €
UVFS
⌀25,4 mm
5 mm
HRs>99,9%+HRp>99,8%@1000-1060 nm
45°
|GDD Rs|<10 fs2, |GDD Rp|<20 fs2
36656
140 €
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